Comparison of magnetic properties of ultrathin Co/Si(1 1 1) and Co/Ag/Si(1 1 1) films

J. S. Tsay*, Y. D. Yao, Y. Liou, S. F. Lee, C. S. Yang

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

7 Citations (Scopus)


The thermal stability of the magnetization of the Co/Ag/Si(1 1 1) film is lower than that of the Co/Si(1 1 1) film. From Auger electron spectroscopy, we demonstrate that Ag atoms in the Co/Ag/Si(1 1 1) film segregate to top layers below 350 K. The segregation of Ag atoms improves the diffusion of Co into Si(1 1 1) substrate. Annealing 10.5 ML Co/Si(1 1 1) film causes the easy axis of magnetization to transform from an in-plane to a cant out-of-plane. The in-plane magnetization of 10.5 ML in Co/Ag/Si(1 1 1) film persists after annealing.

Original languageEnglish
Pages (from-to)208-210
Number of pages3
JournalJournal of Magnetism and Magnetic Materials
Issue number1-3
Publication statusPublished - 2000 Feb
Externally publishedYes
EventProceedings of the 1999 International Symposium on Advanced Magnetic Technologies (ISAMT'99) - Taipei, Taiwan
Duration: 1999 May 241999 May 25

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics


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