Chiral anomaly and Weyl orbit in three-dimensional Dirac semimetal Cd3As2 grown on Si

  • Wei Chen Lin
  • , Peng Ying Tsai
  • , Jia Zhu Zou
  • , Jie Ying Lee
  • , Chun Wei Kuo
  • , Hsin Hsuan Lee
  • , Ching Yang Pan
  • , Cheng Hsueh Yang
  • , Sheng Zong Chen
  • , Jyh Shyang Wang
  • , Pei Hsun Jiang
  • , Chi Te Liang*
  • , Chiashain Chuang
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Preparing Cd3As2, which is a three-dimensional (3D) Dirac semimetal in certain crystal orientation, on Si is highly desirable as such a sample may well be fully compatible with existing Si CMOS technology. However, there is a dearth of such a study regarding Cd3As2 films grown on Si showing the chiral anomaly. Here, for the first time, we report the novel preparation and fabrication technique of a Cd3As2 (112) film on a Si (111) substrate with a ZnTe (111) buffer layer which explicitly shows the chiral anomaly with a nontrivial Berry’s phase of π. Despite the Hall carrier density ( n 3 D ≈ 9.42 × 10 17 cm−3) of our Cd3As2 film, which is almost beyond the limit for the portents of a 3D Dirac semimetal to emerge, we observe large linear magnetoresistance in a perpendicular magnetic field and negative magnetoresistance in a parallel magnetic field. These results clearly demonstrate the chiral magnetic effect and 3D Dirac semimetallic behavior in our silicon-based Cd3As2 film. Our tailoring growth of Cd3As2 on a conventional substrate such as Si keeps the sample quality, while also achieving a low carrier concentration.

Original languageEnglish
Article number165002
JournalNanotechnology
Volume35
Issue number16
DOIs
Publication statusPublished - 2024 Apr 15

Keywords

  • CdAs
  • Si CMOS
  • chiral anomaly
  • weak antilocalization

ASJC Scopus subject areas

  • Bioengineering
  • General Chemistry
  • General Materials Science
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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