Characterizations and process parameters of titanium dioxide thin film by RF sputtering

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

In this study, we successfully combined RF magnetron sputtering of a pure Ti metal target and one-stage oxidation process with a wider oxygen ratio (10%-90%) and total sputtering flow rate (16-24 sccm) to produce TiO2 thin films on a glass substrate. The crystallization, morphology, roughness, and thickness of the thin films were examined using XRD, HR-FESEM, AFM, and a profilometer. Subsequently, the photocatalytic performance was examined using a spectrometer and video tensiometer. The experimental results show that the TiO2 thin films with a majority of anatase and higher roughness exhibit superior photocatalytic performance; the total sputtering gas flow rate of 18 sccm and oxygen content at 10% is the optimal option. Finally, an empirical formula to correlate the film thickness with deposition time was conducted for the sputtering flow rate of 18 sccm and the oxygen content of 10%.

Original languageEnglish
Pages (from-to)9-21
Number of pages13
JournalJournal of Nano Research
Volume22
DOIs
Publication statusPublished - 2013 May 15

Fingerprint

titanium oxides
Titanium dioxide
Sputtering
flow velocity
sputtering
Flow rate
Oxygen
Thin films
oxygen
roughness
thin films
Surface roughness
tensiometers
profilometers
Crystallization
anatase
Magnetron sputtering
gas flow
Flow of gases
Film thickness

Keywords

  • Oxidation
  • Photocatalytic performance
  • Thin films
  • Titanium dioxide

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy(all)

Cite this

Characterizations and process parameters of titanium dioxide thin film by RF sputtering. / Yang, Chii Rong; Teng, Tun Ping; Yeh, Yun Yu.

In: Journal of Nano Research, Vol. 22, 15.05.2013, p. 9-21.

Research output: Contribution to journalArticle

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