Characteristics of YBa2Cu3O7-y Josephson junctions prepared with smooth ramp-edge surfaces

L. M. Wang, H. H. Sung, Hong-Chang Yang, M. J. Chen, C. H. Wu, N. L. Chiu, Herng-Er Horng

    Research output: Contribution to journalConference article

    2 Citations (Scopus)

    Abstract

    YBa2Cu3O7-y ramp-type Josephson junctions with PrBa2Cu3O7-y and SrTiO3 barriers have been fabricated on SrTiO3 (001) substrates. The surface morphology of the ramp-edge was examined using the atomic force microscope (AFM). The conditions of the photolithography process and the ion beam incident angle were optimized to improve the surface roughness at the ramp-edge. Typically, smooth surfaces at the ramp-edge with a ramp angle of about 25° and an average roughness of about 3 nm was achieved. Results indicate the junction properties are improved with a smooth ramp-edge surface. The details are discussed.

    Original languageEnglish
    Pages (from-to)2729-2730
    Number of pages2
    JournalPhysica C: Superconductivity and its Applications
    Volume341-348 (IV)
    DOIs
    Publication statusPublished - 2000 Jan 1
    EventInternational Conference on Materials and Mechanisms of Superconductivity High Temperature Superconductors VI - Houston, TX, USA
    Duration: 2000 Feb 202000 Feb 25

    Fingerprint

    ramps
    Josephson junctions
    Surface roughness
    Photolithography
    Ion beams
    Surface morphology
    Microscopes
    Substrates
    photolithography
    strontium titanium oxide
    barium copper yttrium oxide
    surface roughness
    roughness
    ion beams
    microscopes

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Energy Engineering and Power Technology
    • Electrical and Electronic Engineering

    Cite this

    Characteristics of YBa2Cu3O7-y Josephson junctions prepared with smooth ramp-edge surfaces. / Wang, L. M.; Sung, H. H.; Yang, Hong-Chang; Chen, M. J.; Wu, C. H.; Chiu, N. L.; Horng, Herng-Er.

    In: Physica C: Superconductivity and its Applications, Vol. 341-348 (IV), 01.01.2000, p. 2729-2730.

    Research output: Contribution to journalConference article

    Wang, L. M. ; Sung, H. H. ; Yang, Hong-Chang ; Chen, M. J. ; Wu, C. H. ; Chiu, N. L. ; Horng, Herng-Er. / Characteristics of YBa2Cu3O7-y Josephson junctions prepared with smooth ramp-edge surfaces. In: Physica C: Superconductivity and its Applications. 2000 ; Vol. 341-348 (IV). pp. 2729-2730.
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    abstract = "YBa2Cu3O7-y ramp-type Josephson junctions with PrBa2Cu3O7-y and SrTiO3 barriers have been fabricated on SrTiO3 (001) substrates. The surface morphology of the ramp-edge was examined using the atomic force microscope (AFM). The conditions of the photolithography process and the ion beam incident angle were optimized to improve the surface roughness at the ramp-edge. Typically, smooth surfaces at the ramp-edge with a ramp angle of about 25° and an average roughness of about 3 nm was achieved. Results indicate the junction properties are improved with a smooth ramp-edge surface. The details are discussed.",
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    AU - Wang, L. M.

    AU - Sung, H. H.

    AU - Yang, Hong-Chang

    AU - Chen, M. J.

    AU - Wu, C. H.

    AU - Chiu, N. L.

    AU - Horng, Herng-Er

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    N2 - YBa2Cu3O7-y ramp-type Josephson junctions with PrBa2Cu3O7-y and SrTiO3 barriers have been fabricated on SrTiO3 (001) substrates. The surface morphology of the ramp-edge was examined using the atomic force microscope (AFM). The conditions of the photolithography process and the ion beam incident angle were optimized to improve the surface roughness at the ramp-edge. Typically, smooth surfaces at the ramp-edge with a ramp angle of about 25° and an average roughness of about 3 nm was achieved. Results indicate the junction properties are improved with a smooth ramp-edge surface. The details are discussed.

    AB - YBa2Cu3O7-y ramp-type Josephson junctions with PrBa2Cu3O7-y and SrTiO3 barriers have been fabricated on SrTiO3 (001) substrates. The surface morphology of the ramp-edge was examined using the atomic force microscope (AFM). The conditions of the photolithography process and the ion beam incident angle were optimized to improve the surface roughness at the ramp-edge. Typically, smooth surfaces at the ramp-edge with a ramp angle of about 25° and an average roughness of about 3 nm was achieved. Results indicate the junction properties are improved with a smooth ramp-edge surface. The details are discussed.

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