INIS
substrates
100%
field effect transistors
100%
germanium
100%
layers
64%
thickness
28%
interfaces
21%
comparative evaluations
14%
strains
14%
oxides
14%
transistors
14%
hole mobility
14%
confinement
14%
electron mobility
14%
devices
7%
accumulation
7%
voltage
7%
capacitance
7%
curves
7%
metals
7%
leakage current
7%
peaks
7%
holes
7%
epitaxy
7%
carriers
7%
chemical vapor deposition
7%
transmission electron microscopy
7%
semiconductor materials
7%
traps
7%
raman spectroscopy
7%
charge density
7%
ultrahigh vacuum
7%
Physics
Substrates
100%
Field Effect Transistor
100%
Germanium
100%
Confinement
14%
Electron Mobility
14%
Oxide
7%
Capacitance
7%
Region
7%
Electric Potential
7%
Transmission Electron Microscopy
7%
Raman Spectroscopy
7%
Accumulations
7%
Ultrahigh Vacuum
7%
Material Science
Field Effect Transistor
100%
Germanium
100%
Strain
14%
Transistor
14%
Hole Mobility
14%
Electron Mobility
14%
Devices
7%
Oxide
7%
Capacitance
7%
Density
7%
Metal Oxide
7%
Chemical Vapor Deposition
7%
Raman Spectroscopy
7%
Transmission Electron Microscopy
7%
Oxide Semiconductor
7%
Epitaxial Layer
7%
Semiconductor Structure
7%