Characteristics of high-Tc josephson junction fabricated by focused ION beam and ION damage

Chiu Hsien Wu*, Wei Cheng Kuo, Yu Te Chou, Jau Han Chen, Hong Chang Yang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


A high-Tc Josephson junction and superconducting quantum interference devices (SQUIDs) were fabricated by focused ion beam (FIB) milling and 150 keV oxygen ion implantation. A single layer gold mask with a small aperture of 28-73 nm defined by direct milling with FIB, was used. The voltage versus current characteristics of high-Tc YBa2Cu 3O7-x Josephson junctions were measured under microwaves. Shapiro steps were observed in the single junction. The voltage versus current and voltage versus magnetic field characteristics of a SQUID were measured.

Original languageEnglish
Article number5153032
Pages (from-to)210-213
Number of pages4
JournalIEEE Transactions on Applied Superconductivity
Issue number3
Publication statusPublished - 2009 Jun


  • Focused ion beam
  • Ion implantation
  • Josephson junction

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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