Characteristics of high-Tc josephson junction fabricated by focused ION beam and ION damage

Chiu Hsien Wu, Wei Cheng Kuo, Yu Te Chou, Jau Han Chen, Hong Chang Yang

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A high-Tc Josephson junction and superconducting quantum interference devices (SQUIDs) were fabricated by focused ion beam (FIB) milling and 150 keV oxygen ion implantation. A single layer gold mask with a small aperture of 28-73 nm defined by direct milling with FIB, was used. The voltage versus current characteristics of high-Tc YBa2Cu 3O7-x Josephson junctions were measured under microwaves. Shapiro steps were observed in the single junction. The voltage versus current and voltage versus magnetic field characteristics of a SQUID were measured.

Original languageEnglish
Article number5153032
Pages (from-to)210-213
Number of pages4
JournalIEEE Transactions on Applied Superconductivity
Volume19
Issue number3
DOIs
Publication statusPublished - 2009 Jun 1

Keywords

  • Focused ion beam
  • Ion implantation
  • Josephson junction
  • SQUID

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Characteristics of high-T<sub>c</sub> josephson junction fabricated by focused ION beam and ION damage'. Together they form a unique fingerprint.

  • Cite this