Characteristics and hot-carrier effects of strained pMOSFETs with SiGe channel and embedded SiGe source/drain stressors

Mu Chun Wang, Shea Jue Wang*, Heng Sheng Huang, Shuang Yuan Chen, Min Ru Peng, Liang Ru Ji, Ming Feng Lu, Wen Shiang Liao, Chuan Hsi Liu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy