Channel modification engineering by plasma processing in tin-oxide thin film transistor: Experimental results and first-principles calculation
- Y. C. Chiu
- , P. C. Chen
- , S. L. Chang
- , Z. W. Zheng
- , C. H. Cheng
- , G. L. Liou
- , H. L. Kao
- , Y. H. Wu
- , C. Y. Chang
Research output: Contribution to journal › Article › peer-review
5
Link opens in a new tab
Citations
(Scopus)