Abstract
An effective method for the catalyst-free selective-area growth of single-crystalline zinc oxide nanowires on patterned substrates defined by e-beam lithography and treated by chemical etching with increased surface roughness is reported. The nanowire growth is realized via a surface-roughness-assisted vapor-solid mechanism by thermal evaporation. The nanowires are vertically aligned on sapphire and randomly oriented on silicon substrates.
| Original language | English |
|---|---|
| Pages (from-to) | 141-144 |
| Number of pages | 4 |
| Journal | Chemical Physics Letters |
| Volume | 463 |
| Issue number | 1-3 |
| DOIs | |
| Publication status | Published - 2008 Sept 22 |
ASJC Scopus subject areas
- General Physics and Astronomy
- Physical and Theoretical Chemistry