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Boosting the memory window of ferroelectric tunnel junctions via ultra-thin SiO2 interfacial layer engineering

  • J. F. Wang
  • , Y. T. Chang
  • , J. Y. Lee
  • , C. W. Liu
  • , M. H. Lee*
    • *Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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