Abstract
We reported an ultra low-power resistive random access memory (RRAM) combining a low-cost Ni electrode and covalent-bond GeOx dielectric. This cost-effective Ni/GeOx/TaN RRAM device has very small set power of 2 μW, ultra-low reset power of 130 pW, greater than 1 order of magnitude resistance window, and stable retention at 85 °C. The current flow at low-resistance state is governed by Poole-Frenkel conduction with electrons hopping via defect traps, which is quite different from the filament conduction in metal-oxide RRAM.
| Original language | English |
|---|---|
| Pages (from-to) | 90-93 |
| Number of pages | 4 |
| Journal | Solid-State Electronics |
| Volume | 62 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2011 Aug |
| Externally published | Yes |
Keywords
- Germanium oxide (GeO)
- Resistive random access memory (RRAM)
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry