Bipolar Conduction in Tin-Oxide Semiconductor Channel Treated by Oxygen Plasma for Low-Power Thin-Film Transistor Application

Po Chun Chen, Yung Hsien Wu, Zhi Wei Zheng, Yu Chien Chiu, Chun Hu Cheng, Shiang Shiou Yen, Hsiao Hsuan Hsu, Chun Yen Chang

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

In this paper, we investigated the bipolar conduction mechanism in thin-film transistors (TFTs) with oxygen plasma treatment on tin-oxide channel. The optimized p-type thin-oxide TFTs showed an on/off ratio of >104 , a threshold voltage of -1.05 V, and a field-effect mobility of 2.14 cm2 · V-1 · s-1. By increasing the exposure time of oxygen plasma, excess oxygen was incorporated to thin-oxide channel and converted thin monoxide to oxygen-rich n-type thin dioxide, which in turn led to n-type operation. It indicated that oxygen plasma was the critical factor to determine oxygen concentration, oxygen vacancies, metal ions and channel polarity. This proposed oxygen-content tuning through plasma treatment approach shows great promise in simplification of TFT process that can achieve n-type and p-type TFTs under the same device process.

Original languageEnglish
Article number7165597
Pages (from-to)224-227
Number of pages4
JournalJournal of Display Technology
Volume12
Issue number3
DOIs
Publication statusPublished - 2016 Mar

Fingerprint

oxygen plasma
Thin film transistors
Tin oxides
tin oxides
transistors
Oxygen
Plasmas
conduction
oxygen
thin films
oxides
dioxides
simplification
threshold voltage
metal ions
polarity
Oxygen vacancies
tuning
Oxide semiconductors
Power transistors

Keywords

  • Bipolar
  • oxygen plasma treatment
  • thin-film transistor (TFT)
  • tin-monoxide (SnO)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Bipolar Conduction in Tin-Oxide Semiconductor Channel Treated by Oxygen Plasma for Low-Power Thin-Film Transistor Application. / Chen, Po Chun; Wu, Yung Hsien; Zheng, Zhi Wei; Chiu, Yu Chien; Cheng, Chun Hu; Yen, Shiang Shiou; Hsu, Hsiao Hsuan; Chang, Chun Yen.

In: Journal of Display Technology, Vol. 12, No. 3, 7165597, 03.2016, p. 224-227.

Research output: Contribution to journalArticle

Chen, Po Chun ; Wu, Yung Hsien ; Zheng, Zhi Wei ; Chiu, Yu Chien ; Cheng, Chun Hu ; Yen, Shiang Shiou ; Hsu, Hsiao Hsuan ; Chang, Chun Yen. / Bipolar Conduction in Tin-Oxide Semiconductor Channel Treated by Oxygen Plasma for Low-Power Thin-Film Transistor Application. In: Journal of Display Technology. 2016 ; Vol. 12, No. 3. pp. 224-227.
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AU - Chiu, Yu Chien

AU - Cheng, Chun Hu

AU - Yen, Shiang Shiou

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