Atomic view of the upward movement of step-edge and in-layer atoms of ir surfaces

Tsu Yi Fu, Yi Ren Tzeng, Tien T. Tsong

Research output: Contribution to journalArticlepeer-review

37 Citations (Scopus)


The behavior of adatoms, step-edge atoms, and in-layer atoms at high temperature plays an important role in determining the growth mode of epitaxial thin films and crystals, the crystal shape change, and the morphology of crystal surfaces. From a direct field ion microscope observation, we find that around 500 K an edge atom of the Ir(111) step can ascend the step to the upper terrace as well as dissociate to the lower terrace. The activation barrier height for the ascending motion is measured to be 1.51+/−0.10 eV, whereas the dissociation barrier is ∼1.6+/−0.2eV. Surprisingly, we also find that in-layer atoms can jump up to terrace sites, thus forming adatom-vacancy complexes, at unexpectedly low temperatures.

Original languageEnglish
Pages (from-to)2539-2542
Number of pages4
JournalPhysical Review Letters
Issue number14
Publication statusPublished - 1996

ASJC Scopus subject areas

  • General Physics and Astronomy


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