Atomic-scale determination of band offsets at the Gd2O 3/GaAs (100) hetero-interface using scanning tunneling spectroscopy

  • Y. P. Chiu*
  • , B. C. Huang
  • , M. C. Shih
  • , J. Y. Shen
  • , P. Chang
  • , C. S. Chang
  • , M. L. Huang
  • , M. H. Tsai
  • , M. Hong
  • , J. Kwo
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Direct measurements of band profile and band offsets across the Gd 2O3/GaAs(100) hetero-interface have been performed using cross-sectional scanning tunneling microscopy and spectroscopy. The spatial variation of the local density of states with atomic precision revealed the interfacial band alignment in this model high-/III-V system. In conjunction with the theoretical modeling, the band offsets for both conduction and valence states are identified, revealing critical information about the electrostatic potential landscape of the GaAs semiconductor transistor with a Gd 2O3 gate dielectric.

Original languageEnglish
Article number212101
JournalApplied Physics Letters
Volume99
Issue number21
DOIs
Publication statusPublished - 2011 Nov 21
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint

Dive into the research topics of 'Atomic-scale determination of band offsets at the Gd2O 3/GaAs (100) hetero-interface using scanning tunneling spectroscopy'. Together they form a unique fingerprint.

Cite this