Atomic processes in self-diffusion of Ni surfaces

Tsu Yi Fu; Tien T. Tsong

doi:10.1016/S0039-6028(00)00095-9

Atomic processes in self-diffusion of Ni surfaces

Tsu Yi Fu, Tien T. Tsong

Department of Physics

Research output: Contribution to journal › Conference article › peer-review

31 Citations (Scopus)

Abstract

Using a field ion microscope, we have probed the diffusion behavior of Ni adatoms on Ni surfaces. Activation barrier heights have been derived to be 0.22±0.02 eV and 0.59±0.03 eV for self-diffusion on Ni(111) and Ni(001), and 0.84±0.19 eV for the `ascending' motion of Ni(111) step edge atoms. From the visit site maps, we have experimentally determined the mechanism of self-diffusion on Ni(001) surfaces to be atomic exchange.

Original language	English
Pages (from-to)	571-574
Number of pages	4
Journal	Surface Science
Volume	454
Issue number	1
DOIs	https://doi.org/10.1016/S0039-6028(00)00095-9
Publication status	Published - 2000 May 20
Event	ECOSS-18: 18th European Conference on Surface Science - Vienna, Austria Duration: 1999 Sept 21 → 1999 Sept 24

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/S0039-6028(00)00095-9

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abstract = "Using a field ion microscope, we have probed the diffusion behavior of Ni adatoms on Ni surfaces. Activation barrier heights have been derived to be 0.22±0.02 eV and 0.59±0.03 eV for self-diffusion on Ni(111) and Ni(001), and 0.84±0.19 eV for the `ascending' motion of Ni(111) step edge atoms. From the visit site maps, we have experimentally determined the mechanism of self-diffusion on Ni(001) surfaces to be atomic exchange.",

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AU - Tsong, Tien T.

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N2 - Using a field ion microscope, we have probed the diffusion behavior of Ni adatoms on Ni surfaces. Activation barrier heights have been derived to be 0.22±0.02 eV and 0.59±0.03 eV for self-diffusion on Ni(111) and Ni(001), and 0.84±0.19 eV for the `ascending' motion of Ni(111) step edge atoms. From the visit site maps, we have experimentally determined the mechanism of self-diffusion on Ni(001) surfaces to be atomic exchange.

AB - Using a field ion microscope, we have probed the diffusion behavior of Ni adatoms on Ni surfaces. Activation barrier heights have been derived to be 0.22±0.02 eV and 0.59±0.03 eV for self-diffusion on Ni(111) and Ni(001), and 0.84±0.19 eV for the `ascending' motion of Ni(111) step edge atoms. From the visit site maps, we have experimentally determined the mechanism of self-diffusion on Ni(001) surfaces to be atomic exchange.

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T2 - ECOSS-18: 18th European Conference on Surface Science

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Atomic processes in self-diffusion of Ni surfaces

Abstract

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