Atomic processes in self-diffusion of Ni surfaces

Tsu Yi Fu, Tien T. Tsong

Research output: Contribution to journalConference articlepeer-review

29 Citations (Scopus)


Using a field ion microscope, we have probed the diffusion behavior of Ni adatoms on Ni surfaces. Activation barrier heights have been derived to be 0.22±0.02 eV and 0.59±0.03 eV for self-diffusion on Ni(111) and Ni(001), and 0.84±0.19 eV for the `ascending' motion of Ni(111) step edge atoms. From the visit site maps, we have experimentally determined the mechanism of self-diffusion on Ni(001) surfaces to be atomic exchange.

Original languageEnglish
Pages (from-to)571-574
Number of pages4
JournalSurface Science
Issue number1
Publication statusPublished - 2000 May 20
EventECOSS-18: 18th European Conference on Surface Science - Vienna, Austria
Duration: 1999 Sept 211999 Sept 24

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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