Atomic Layer Deposition Plasma-Based Undoped-HfO2Ferroelectric FETs for Non-Volatile Memory

Jun Dao Luo, Yu Ying Lai, Kuo Yu Hsiang, Chia Feng Wu, Hao Tung Chung, Wei Shuo Li, Chun Yu Liao, Pin Guang Chen, Kuan Neng Chen, Min Hung Lee*, Huang Chung Cheng

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds