As grown Bi2Sr2CaCu2Oy films by an off axis RF magnetron

J. H. Lu; H. C. Yang; H. E. Horng

doi:10.1016/0921-4526(94)91667-5

As grown Bi₂Sr₂CaCu₂O_y films by an off axis RF magnetron

J. H. Lu^*, H. C. Yang, H. E. Horng

^*Corresponding author for this work

Undergraduate Program of Electro-Optical Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Bi₂Sr₂Cu₂O_y (BSCCO) films were in intu grown by an off axis rf magnetron sputtering. The sputtering targets were stoichiometric Bi₂Sr₂CaCu₂O₈ compounds. The sputtering gas was a maximum of O₂ and Ar and the sputtering pressure varied from 50 - 100 mTorr. The films were grown at 570 - 600 °C. After growth the films were quickly cooled down to 300 K in 30 minutes. One found that the distance from the substrate to the target d is an important factor in affecting the deposition rate of the as grown BSCCO films. By reducing the distance d to 3 cm, we have achieved a deposition rate of about 1500 Å per hour in a sputtering power of 60 watts and sputtering pressure of 70 mtorr. With optinum growth conditions where the sustrate temperature was kept at 580 - 600 °C and the pressure was kept at 70 - 80 mTorr, superconducting BSCCO films with zero resistan at 75 - 85 K can be reproduced.

Original language	English
Pages (from-to)	2335-2336
Number of pages	2
Journal	Physica B: Physics of Condensed Matter
Volume	194-196
Issue number	PART 2
DOIs	https://doi.org/10.1016/0921-4526(94)91667-5
Publication status	Published - 1994 Feb 2

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering

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@article{c2c384c2382a46fca72fc172e96c7cec,

title = "As grown Bi2Sr2CaCu2Oy films by an off axis RF magnetron",

abstract = "Bi2Sr2Cu2Oy (BSCCO) films were in intu grown by an off axis rf magnetron sputtering. The sputtering targets were stoichiometric Bi2Sr2CaCu2O8 compounds. The sputtering gas was a maximum of O2 and Ar and the sputtering pressure varied from 50 - 100 mTorr. The films were grown at 570 - 600 °C. After growth the films were quickly cooled down to 300 K in 30 minutes. One found that the distance from the substrate to the target d is an important factor in affecting the deposition rate of the as grown BSCCO films. By reducing the distance d to 3 cm, we have achieved a deposition rate of about 1500 {\AA} per hour in a sputtering power of 60 watts and sputtering pressure of 70 mtorr. With optinum growth conditions where the sustrate temperature was kept at 580 - 600 °C and the pressure was kept at 70 - 80 mTorr, superconducting BSCCO films with zero resistan at 75 - 85 K can be reproduced.",

author = "Lu, {J. H.} and Yang, {H. C.} and Horng, {H. E.}",

note = "Funding Information: *This work is supportedby National Science Council under contact No. NSC81-0212-M-O03-516.",

year = "1994",

month = feb,

day = "2",

doi = "10.1016/0921-4526(94)91667-5",

language = "English",

volume = "194-196",

pages = "2335--2336",

journal = "Physica B: Physics of Condensed Matter",

issn = "0921-4526",

publisher = "Elsevier BV",

number = "PART 2",

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TY - JOUR

T1 - As grown Bi2Sr2CaCu2Oy films by an off axis RF magnetron

AU - Lu, J. H.

AU - Yang, H. C.

AU - Horng, H. E.

N1 - Funding Information: *This work is supportedby National Science Council under contact No. NSC81-0212-M-O03-516.

PY - 1994/2/2

Y1 - 1994/2/2

N2 - Bi2Sr2Cu2Oy (BSCCO) films were in intu grown by an off axis rf magnetron sputtering. The sputtering targets were stoichiometric Bi2Sr2CaCu2O8 compounds. The sputtering gas was a maximum of O2 and Ar and the sputtering pressure varied from 50 - 100 mTorr. The films were grown at 570 - 600 °C. After growth the films were quickly cooled down to 300 K in 30 minutes. One found that the distance from the substrate to the target d is an important factor in affecting the deposition rate of the as grown BSCCO films. By reducing the distance d to 3 cm, we have achieved a deposition rate of about 1500 Å per hour in a sputtering power of 60 watts and sputtering pressure of 70 mtorr. With optinum growth conditions where the sustrate temperature was kept at 580 - 600 °C and the pressure was kept at 70 - 80 mTorr, superconducting BSCCO films with zero resistan at 75 - 85 K can be reproduced.

AB - Bi2Sr2Cu2Oy (BSCCO) films were in intu grown by an off axis rf magnetron sputtering. The sputtering targets were stoichiometric Bi2Sr2CaCu2O8 compounds. The sputtering gas was a maximum of O2 and Ar and the sputtering pressure varied from 50 - 100 mTorr. The films were grown at 570 - 600 °C. After growth the films were quickly cooled down to 300 K in 30 minutes. One found that the distance from the substrate to the target d is an important factor in affecting the deposition rate of the as grown BSCCO films. By reducing the distance d to 3 cm, we have achieved a deposition rate of about 1500 Å per hour in a sputtering power of 60 watts and sputtering pressure of 70 mtorr. With optinum growth conditions where the sustrate temperature was kept at 580 - 600 °C and the pressure was kept at 70 - 80 mTorr, superconducting BSCCO films with zero resistan at 75 - 85 K can be reproduced.

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JO - Physica B: Physics of Condensed Matter

JF - Physica B: Physics of Condensed Matter

IS - PART 2

ER -

As grown Bi₂Sr₂CaCu₂O_y films by an off axis RF magnetron

Abstract

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