As grown Bi2Sr2CaCu2Oy films by an off axis RF magnetron

J. H. Lu, Hong-Chang Yang, Herng-Er Horng

    Research output: Contribution to journalArticle

    Abstract

    Bi2Sr2Cu2Oy (BSCCO) films were in intu grown by an off axis rf magnetron sputtering. The sputtering targets were stoichiometric Bi2Sr2CaCu2O8 compounds. The sputtering gas was a maximum of O2 and Ar and the sputtering pressure varied from 50 - 100 mTorr. The films were grown at 570 - 600 °C. After growth the films were quickly cooled down to 300 K in 30 minutes. One found that the distance from the substrate to the target d is an important factor in affecting the deposition rate of the as grown BSCCO films. By reducing the distance d to 3 cm, we have achieved a deposition rate of about 1500 Å per hour in a sputtering power of 60 watts and sputtering pressure of 70 mtorr. With optinum growth conditions where the sustrate temperature was kept at 580 - 600 °C and the pressure was kept at 70 - 80 mTorr, superconducting BSCCO films with zero resistan at 75 - 85 K can be reproduced.

    Original languageEnglish
    Pages (from-to)2335-2336
    Number of pages2
    JournalPhysica B: Physics of Condensed Matter
    Volume194-196
    Issue numberPART 2
    DOIs
    Publication statusPublished - 1994 Feb 2

    Fingerprint

    Sputtering
    sputtering
    Deposition rates
    Superconducting films
    Magnetron sputtering
    magnetron sputtering
    Gases
    Substrates
    gases
    Temperature
    temperature

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Electrical and Electronic Engineering

    Cite this

    As grown Bi2Sr2CaCu2Oy films by an off axis RF magnetron. / Lu, J. H.; Yang, Hong-Chang; Horng, Herng-Er.

    In: Physica B: Physics of Condensed Matter, Vol. 194-196, No. PART 2, 02.02.1994, p. 2335-2336.

    Research output: Contribution to journalArticle

    Lu, J. H. ; Yang, Hong-Chang ; Horng, Herng-Er. / As grown Bi2Sr2CaCu2Oy films by an off axis RF magnetron. In: Physica B: Physics of Condensed Matter. 1994 ; Vol. 194-196, No. PART 2. pp. 2335-2336.
    @article{bb5a6aceca17473e88be86fe6b34a91c,
    title = "As grown Bi2Sr2CaCu2Oy films by an off axis RF magnetron",
    abstract = "Bi2Sr2Cu2Oy (BSCCO) films were in intu grown by an off axis rf magnetron sputtering. The sputtering targets were stoichiometric Bi2Sr2CaCu2O8 compounds. The sputtering gas was a maximum of O2 and Ar and the sputtering pressure varied from 50 - 100 mTorr. The films were grown at 570 - 600 °C. After growth the films were quickly cooled down to 300 K in 30 minutes. One found that the distance from the substrate to the target d is an important factor in affecting the deposition rate of the as grown BSCCO films. By reducing the distance d to 3 cm, we have achieved a deposition rate of about 1500 {\AA} per hour in a sputtering power of 60 watts and sputtering pressure of 70 mtorr. With optinum growth conditions where the sustrate temperature was kept at 580 - 600 °C and the pressure was kept at 70 - 80 mTorr, superconducting BSCCO films with zero resistan at 75 - 85 K can be reproduced.",
    author = "Lu, {J. H.} and Hong-Chang Yang and Herng-Er Horng",
    year = "1994",
    month = "2",
    day = "2",
    doi = "10.1016/0921-4526(94)91667-5",
    language = "English",
    volume = "194-196",
    pages = "2335--2336",
    journal = "Physica B: Condensed Matter",
    issn = "0921-4526",
    publisher = "Elsevier",
    number = "PART 2",

    }

    TY - JOUR

    T1 - As grown Bi2Sr2CaCu2Oy films by an off axis RF magnetron

    AU - Lu, J. H.

    AU - Yang, Hong-Chang

    AU - Horng, Herng-Er

    PY - 1994/2/2

    Y1 - 1994/2/2

    N2 - Bi2Sr2Cu2Oy (BSCCO) films were in intu grown by an off axis rf magnetron sputtering. The sputtering targets were stoichiometric Bi2Sr2CaCu2O8 compounds. The sputtering gas was a maximum of O2 and Ar and the sputtering pressure varied from 50 - 100 mTorr. The films were grown at 570 - 600 °C. After growth the films were quickly cooled down to 300 K in 30 minutes. One found that the distance from the substrate to the target d is an important factor in affecting the deposition rate of the as grown BSCCO films. By reducing the distance d to 3 cm, we have achieved a deposition rate of about 1500 Å per hour in a sputtering power of 60 watts and sputtering pressure of 70 mtorr. With optinum growth conditions where the sustrate temperature was kept at 580 - 600 °C and the pressure was kept at 70 - 80 mTorr, superconducting BSCCO films with zero resistan at 75 - 85 K can be reproduced.

    AB - Bi2Sr2Cu2Oy (BSCCO) films were in intu grown by an off axis rf magnetron sputtering. The sputtering targets were stoichiometric Bi2Sr2CaCu2O8 compounds. The sputtering gas was a maximum of O2 and Ar and the sputtering pressure varied from 50 - 100 mTorr. The films were grown at 570 - 600 °C. After growth the films were quickly cooled down to 300 K in 30 minutes. One found that the distance from the substrate to the target d is an important factor in affecting the deposition rate of the as grown BSCCO films. By reducing the distance d to 3 cm, we have achieved a deposition rate of about 1500 Å per hour in a sputtering power of 60 watts and sputtering pressure of 70 mtorr. With optinum growth conditions where the sustrate temperature was kept at 580 - 600 °C and the pressure was kept at 70 - 80 mTorr, superconducting BSCCO films with zero resistan at 75 - 85 K can be reproduced.

    UR - http://www.scopus.com/inward/record.url?scp=0028760130&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=0028760130&partnerID=8YFLogxK

    U2 - 10.1016/0921-4526(94)91667-5

    DO - 10.1016/0921-4526(94)91667-5

    M3 - Article

    AN - SCOPUS:0028760130

    VL - 194-196

    SP - 2335

    EP - 2336

    JO - Physica B: Condensed Matter

    JF - Physica B: Condensed Matter

    SN - 0921-4526

    IS - PART 2

    ER -