Application of density functional theory and photoelectron spectra to the adsorption and reaction of H2S on Si (100)

Tsung Fan Teng, Chun Yi Chou, Wei Hsiu Hung, Jyh Chiang Jiang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

The adsorption and reaction of H2S on a Si(100) surface were investigated using density functional theory (DFT) and X-ray photoelectron spectra (XPS). The decomposition of H2S results in the formation of S adatoms via a HS species. We propose four reaction paths for the decomposition of adsorbed H2S; the corresponding structural conformations of H 2S, HS, and S species are presented. The density of states and electron density difference were utilized to illustrate the interaction between S-containing species and surface Si atoms. The interaction of the surface Si atom and the H atom of H2S facilitates the decomposition of adsorbed H2S. The assignments of XPS data are correlated with the proposed intermediates during the thermal decomposition of H2S.

Original languageEnglish
Pages (from-to)19203-19209
Number of pages7
JournalJournal of Physical Chemistry C
Volume115
Issue number39
DOIs
Publication statusPublished - 2011 Oct 6

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • General Energy
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

Fingerprint

Dive into the research topics of 'Application of density functional theory and photoelectron spectra to the adsorption and reaction of H2S on Si (100)'. Together they form a unique fingerprint.

Cite this