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Antiferroelectric-Based Memcapacitor and Strategy for Non-Destructive Read Operation by Endurance Recovery

  • C. H. Liu
  • , K. Y. Hsiang
  • , F. S. Chang
  • , M. Januar
  • , Y. T. Chang
  • , C. W. Liu
  • , T. H. Hou
  • , M. H. Lee*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The proposed antiferroelectric capacitive memory (AFE-FCM) achieves a symmetric capacitive memory window (CMW) of ∼ 6× ϵ0 with non-destructive readout (NDR) at 0V. The asymmetric capacitance loop (ACL) operation achieves CMW with reduced drive voltage range -1.5V to + 3V or -3V to + 1.5V. The sensing circuit of FCM verifies a significant improvement in sensing voltage for AFE compared to FE. The read endurance with NDR remains beyond 109 cycling. The NDR characteristic gradually transitions to destructive readout (DR) due to the program/erase endurance, which accumulates the imprint effect. The strategy will be proposed to eliminate DR and prolong endurance through a recovery scheme, with a 100-period demonstration. The proposed AFE-FCM boasts promising metrics, including high CMW, NDR, long endurance, a crossbar architecture, a simple structure, and treatment-free capabilities.

Original languageEnglish
Pages (from-to)1101-1104
Number of pages4
JournalIEEE Electron Device Letters
Volume47
Issue number6
DOIs
Publication statusPublished - 2026 Jun 1
Externally publishedYes

Keywords

  • Ferroelectric
  • HfZrO
  • antiferroelectric
  • memcapacitor

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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