Anomalous behavior of LEED beam intensity during annealing

Tsu-Yi Fu, T. F. Liu, C. W. Su, Ching-Song Shern, R. H. Chen

Research output: Contribution to journalArticle

Abstract

Low-energy electron diffraction was used to study the annealing effects of 1 ML Ag on the ultra-thin-film Co/Pt (111). The behavior of the specular beam intensity versus temperature is anomalous. Besides the normal Debye-Waller effect, a bend occurs at 550 K, and a dramatic increase occurs at a higher temperature. A corresponding study by Auger electron spectroscopy and ultraviolet photoelectron spectroscopy indicates that the bend results from the Co inter-diffusion. The anomalous increase indicates that a more stable state forms at a higher temperature. The Co coverage plays an important role in determining the turning temperature. Possible mechanisms are discussed.

Original languageEnglish
Pages (from-to)211-216
Number of pages6
JournalSurface Science
Volume464
Issue number2-3
DOIs
Publication statusPublished - 2000 Oct 1

Fingerprint

Annealing
annealing
ultraviolet spectroscopy
Auger spectroscopy
electron spectroscopy
electron diffraction
photoelectron spectroscopy
Ultraviolet photoelectron spectroscopy
Temperature
temperature
Low energy electron diffraction
Ultrathin films
Auger electron spectroscopy
thin films
energy

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Anomalous behavior of LEED beam intensity during annealing. / Fu, Tsu-Yi; Liu, T. F.; Su, C. W.; Shern, Ching-Song; Chen, R. H.

In: Surface Science, Vol. 464, No. 2-3, 01.10.2000, p. 211-216.

Research output: Contribution to journalArticle

Fu, Tsu-Yi ; Liu, T. F. ; Su, C. W. ; Shern, Ching-Song ; Chen, R. H. / Anomalous behavior of LEED beam intensity during annealing. In: Surface Science. 2000 ; Vol. 464, No. 2-3. pp. 211-216.
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