Annealing effect of ultrathin Ag films on Ni/Pt (111)

C. W. Su, H. Y. Yo, Y. J. Chen, Ching-Song Shern

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The epitaxial growth and alloy formation of Ag-capped layer on NiPt (111) surface were investigated using Auger electron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The growth of Ag on one ML NiPt (111) transforms from layer-by-layer mode into three-dimensional island mode after the growth of one atomic monolayer of Ag. The starting temperature for the alloy formation of Ni-Pt is dependent of the thickness of Ni films. The interface compositions after the high-temperature annealing were studied with the depth-profile analysis of Ar ion sputtering.

Original languageEnglish
Article number124907
JournalJournal of Applied Physics
Volume97
Issue number12
DOIs
Publication statusPublished - 2005 Jul 19

Fingerprint

annealing
ultraviolet spectroscopy
Auger spectroscopy
electron spectroscopy
electron diffraction
sputtering
photoelectron spectroscopy
profiles
ions
temperature
energy

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Annealing effect of ultrathin Ag films on Ni/Pt (111). / Su, C. W.; Yo, H. Y.; Chen, Y. J.; Shern, Ching-Song.

In: Journal of Applied Physics, Vol. 97, No. 12, 124907, 19.07.2005.

Research output: Contribution to journalArticle

Su, C. W. ; Yo, H. Y. ; Chen, Y. J. ; Shern, Ching-Song. / Annealing effect of ultrathin Ag films on Ni/Pt (111). In: Journal of Applied Physics. 2005 ; Vol. 97, No. 12.
@article{e7a7b1b734a047b6821dbe93fcda3373,
title = "Annealing effect of ultrathin Ag films on Ni/Pt (111)",
abstract = "The epitaxial growth and alloy formation of Ag-capped layer on NiPt (111) surface were investigated using Auger electron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The growth of Ag on one ML NiPt (111) transforms from layer-by-layer mode into three-dimensional island mode after the growth of one atomic monolayer of Ag. The starting temperature for the alloy formation of Ni-Pt is dependent of the thickness of Ni films. The interface compositions after the high-temperature annealing were studied with the depth-profile analysis of Ar ion sputtering.",
author = "Su, {C. W.} and Yo, {H. Y.} and Chen, {Y. J.} and Ching-Song Shern",
year = "2005",
month = "7",
day = "19",
doi = "10.1063/1.1929888",
language = "English",
volume = "97",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "12",

}

TY - JOUR

T1 - Annealing effect of ultrathin Ag films on Ni/Pt (111)

AU - Su, C. W.

AU - Yo, H. Y.

AU - Chen, Y. J.

AU - Shern, Ching-Song

PY - 2005/7/19

Y1 - 2005/7/19

N2 - The epitaxial growth and alloy formation of Ag-capped layer on NiPt (111) surface were investigated using Auger electron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The growth of Ag on one ML NiPt (111) transforms from layer-by-layer mode into three-dimensional island mode after the growth of one atomic monolayer of Ag. The starting temperature for the alloy formation of Ni-Pt is dependent of the thickness of Ni films. The interface compositions after the high-temperature annealing were studied with the depth-profile analysis of Ar ion sputtering.

AB - The epitaxial growth and alloy formation of Ag-capped layer on NiPt (111) surface were investigated using Auger electron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The growth of Ag on one ML NiPt (111) transforms from layer-by-layer mode into three-dimensional island mode after the growth of one atomic monolayer of Ag. The starting temperature for the alloy formation of Ni-Pt is dependent of the thickness of Ni films. The interface compositions after the high-temperature annealing were studied with the depth-profile analysis of Ar ion sputtering.

UR - http://www.scopus.com/inward/record.url?scp=21744462553&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=21744462553&partnerID=8YFLogxK

U2 - 10.1063/1.1929888

DO - 10.1063/1.1929888

M3 - Article

AN - SCOPUS:21744462553

VL - 97

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 12

M1 - 124907

ER -