Analysis and modeling of nano-crystalline silicon TFTs on flexible substrate with mechanical strain

M. H. Lee*, S. T. Chang, B. F. Hsieh, J. J. Huang, C. C. Lee

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

The gap state density of nano-crystalline silicon active layers on a flexible substrate was redistributed with mechanical bending. The weak or broken bonds may contribute to the redistribution of trap states. During mechanical strain, the deep states redistributed in a Gaussian distribution, and are dissimilar to ordinary acceptor-like deep states, which manifest with exponential distributions. We conclude that the gap state density with TCAD modeling under mechanical strain is the fundamental reliability issue for the development of flexible electronics.

Original languageEnglish
Pages (from-to)10485-10488
Number of pages4
JournalJournal of Nanoscience and Nanotechnology
Volume11
Issue number12
DOIs
Publication statusPublished - 2011

Keywords

  • Flexible
  • Gap state density
  • Mechanical strain
  • Nano-crystalline silicon

ASJC Scopus subject areas

  • Bioengineering
  • General Chemistry
  • Biomedical Engineering
  • General Materials Science
  • Condensed Matter Physics

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