Aluminium oxide optical film fabricated with ion-assisted deposition using sulphur hexafluoride and oxygen working gases

Yu Yun Chen, Liang Yu Yen, Jin Cherng Hsu*, Huang Lu Chen, Paul W. Wang, Hsiang Lin Liu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Al2O3 thin films fabricated by electron-beam evaporation with ion-assisted deposition at room temperature using O2 or SF6, or their mixture as a working gas were investigated. A significant 20% packing density increase and a low extinction coefficient were obtained when only SF6 was used.

Original languageEnglish
Pages (from-to)293-295
Number of pages3
JournalOptical Review
Volume18
Issue number3
DOIs
Publication statusPublished - 2011 May

Keywords

  • AlO
  • SF
  • ion-assisted deposition
  • optical properties
  • packing density

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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