Adsorption and thermal reaction of short-chain alkanethiols on GaAs(1 0 0)

By means of temperature-programmed desorption (TPD) and X-ray photoemission spectroscopy (XPS) with synchrotron radiation, we investigated the adsorption and thermal decomposition of alkanethiols (RSH, R = CH₃, C₂H₅, and C₄H₉) on a GaAs(1 0 0) surface. All chemisorbed alkanethiols can deprotonate to form thiolates below 300 K via dissociation of the sulfhydryl hydrogen (-SH). Two types of thiolates species are observed on GaAs(1 0 0), according to adsorption on surface Ga and As sites. The thiolates adsorbed on a Ga site preferentially recombine with surface hydrogen to desorb as a molecular thiol at 350-385 K. The thiolate on the As site exhibits greater thermal stability and undergoes mainly dissociation of the C-S bond at ∼520 K, independent of the alkyl chain length. The decomposition of CH₃S either directly desorbs CH₃ or transfers the CH₃ moiety onto the surface. The surface CH₃ further evolves directly from the surface at 665 K. The dissociations of C₂H₅S and C₄H₉S yield surface C₂H₅ and C₄H₉, which further decompose to desorb C₂H₄ and C₄H₈, respectively, via β-hydride elimination. The complete decomposition of alkanethiol leads to the formation of surface S without deposition of carbon. Adsorption of CH₃SSCH₃ results in the formation of surface CH₃S at initial exposures via scission of the S-S bond. Compared with the adsorption of CH₃SH, the CH₃S on the Ga site exhibits greater thermal stability because surface hydrogen is absent. At a high exposure, CH₃SSCH₃ can absorb molecularly on the surface and decompose to desorb CH₃SCH₃ via formation of a CH₃SS intermediate.