Adsorption and decomposition of H2S on InP(100)

Wei Hsiu Hung; Hung Chih Chen; Che Chen Chang; Jyh Tsung Hsieh; Huey Liang Hwang

doi:10.1021/jp984629o

Adsorption and decomposition of H₂S on InP(100)

Wei Hsiu Hung^*
, Hung Chih Chen
, Che Chen Chang
, Jyh Tsung Hsieh
, Huey Liang Hwang

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

The adsorption and thermal reaction of H₂S on the InP(100) surface is studied by synchrotron radiation (SR) soft X-ray photoelectron spectroscopy. In addition to molecular adsorption, H₂S decomposes to form the dissociative species of S, HS, and H on the surface at 100 K. The S atom of the sulfide species preferentially bonds to the In atom, and the H atom generated by the H₂S dissociation bonds to the P atom. H₂S molecules may physisorb on the surface in the form of an icelike multilayer/cluster at low temperatures, even at low coverages. The irradiation of SR white light can induce an alternative reaction of H₂S with the InP surface to form a thicker sulfur layer than that obtained by thermal deposition. The resulting sulfur layer may provide chemical protection for the InP substrate from further reaction.

Original language	English
Pages (from-to)	3663-3668
Number of pages	6
Journal	Journal of Physical Chemistry B
Volume	103
Issue number	18
DOIs	https://doi.org/10.1021/jp984629o
Publication status	Published - 1999 May 6
Externally published	Yes

ASJC Scopus subject areas

Physical and Theoretical Chemistry
Surfaces, Coatings and Films
Materials Chemistry

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10.1021/jp984629o

Cite this

@article{d6ff99d5d0d947a18ecb5837c6a250c1,

title = "Adsorption and decomposition of H2S on InP(100)",

abstract = "The adsorption and thermal reaction of H2S on the InP(100) surface is studied by synchrotron radiation (SR) soft X-ray photoelectron spectroscopy. In addition to molecular adsorption, H2S decomposes to form the dissociative species of S, HS, and H on the surface at 100 K. The S atom of the sulfide species preferentially bonds to the In atom, and the H atom generated by the H2S dissociation bonds to the P atom. H2S molecules may physisorb on the surface in the form of an icelike multilayer/cluster at low temperatures, even at low coverages. The irradiation of SR white light can induce an alternative reaction of H2S with the InP surface to form a thicker sulfur layer than that obtained by thermal deposition. The resulting sulfur layer may provide chemical protection for the InP substrate from further reaction.",

author = "Hung, \{Wei Hsiu\} and Chen, \{Hung Chih\} and Chang, \{Che Chen\} and Hsieh, \{Jyh Tsung\} and Hwang, \{Huey Liang\}",

year = "1999",

month = may,

day = "6",

doi = "10.1021/jp984629o",

language = "English",

volume = "103",

pages = "3663--3668",

journal = "Journal of Physical Chemistry B",

issn = "1520-6106",

publisher = "American Chemical Society",

number = "18",

}

TY - JOUR

T1 - Adsorption and decomposition of H2S on InP(100)

AU - Hung, Wei Hsiu

AU - Chen, Hung Chih

AU - Chang, Che Chen

AU - Hsieh, Jyh Tsung

AU - Hwang, Huey Liang

PY - 1999/5/6

Y1 - 1999/5/6

N2 - The adsorption and thermal reaction of H2S on the InP(100) surface is studied by synchrotron radiation (SR) soft X-ray photoelectron spectroscopy. In addition to molecular adsorption, H2S decomposes to form the dissociative species of S, HS, and H on the surface at 100 K. The S atom of the sulfide species preferentially bonds to the In atom, and the H atom generated by the H2S dissociation bonds to the P atom. H2S molecules may physisorb on the surface in the form of an icelike multilayer/cluster at low temperatures, even at low coverages. The irradiation of SR white light can induce an alternative reaction of H2S with the InP surface to form a thicker sulfur layer than that obtained by thermal deposition. The resulting sulfur layer may provide chemical protection for the InP substrate from further reaction.

AB - The adsorption and thermal reaction of H2S on the InP(100) surface is studied by synchrotron radiation (SR) soft X-ray photoelectron spectroscopy. In addition to molecular adsorption, H2S decomposes to form the dissociative species of S, HS, and H on the surface at 100 K. The S atom of the sulfide species preferentially bonds to the In atom, and the H atom generated by the H2S dissociation bonds to the P atom. H2S molecules may physisorb on the surface in the form of an icelike multilayer/cluster at low temperatures, even at low coverages. The irradiation of SR white light can induce an alternative reaction of H2S with the InP surface to form a thicker sulfur layer than that obtained by thermal deposition. The resulting sulfur layer may provide chemical protection for the InP substrate from further reaction.

UR - https://www.scopus.com/pages/publications/0011058504

UR - https://www.scopus.com/pages/publications/0011058504#tab=citedBy

U2 - 10.1021/jp984629o

DO - 10.1021/jp984629o

M3 - Article

AN - SCOPUS:0011058504

SN - 1520-6106

VL - 103

SP - 3663

EP - 3668

JO - Journal of Physical Chemistry B

JF - Journal of Physical Chemistry B

IS - 18

ER -

Adsorption and decomposition of H₂S on InP(100)

Abstract

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