Achieving high-scalability negative capacitance FETs with uniform Sub-35 mV/dec switch using dopant-free hafnium oxide and gate strain

Chia Chi Fan, Chun Hu Cheng, Chun Yuan Tu, Chien Liu, Wan Hsin Chen, Tun Jen Chang, Chun Yen Chang

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

15 Citations (Scopus)

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Material Science

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Engineering