A sub-wavelength level polarizer with high contract and high tolerance of incident ray's angle in the range of visible wavelength

Yi Chien Lo, Kai Yuan Cheng, Tun Chien Teng, Ching Cherng Sun

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In the paper, we design a sub-wavelength level polarizer to replace the traditional polarizer in various optical applications. The structure of the polarizer is a one-dimension periodic grating. It has three layers with different materials. We do the basic design by using "Effective Medium Theorem." And we verify and improve the result by using rigorous couple-wave analysis (RCWA). In the range of visible wavelength, the polarizer has high contrast and high tolerance of incident angle in three-dimension space.

Original languageEnglish
Title of host publicationNanoengineering
Subtitle of host publicationFabrication, Properties, Optics, and Devices IV
Volume6645
DOIs
Publication statusPublished - 2007 Dec 1
EventNanoengineering: Fabrication, Properties, Optics, and Devices IV - San Diego, CA, United States
Duration: 2007 Aug 272007 Aug 30

Other

OtherNanoengineering: Fabrication, Properties, Optics, and Devices IV
CountryUnited States
CitySan Diego, CA
Period07/8/2707/8/30

Fingerprint

polarizers
Tolerance
Half line
rays
Wavelength
Angle
wavelengths
Range of data
Gratings
One Dimension
Three-dimension
Verify
Theorem
theorems
gratings
Design

Keywords

  • Polarizer
  • Rigorous couple-wave analysis
  • Sub-wavelength

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Lo, Y. C., Cheng, K. Y., Teng, T. C., & Sun, C. C. (2007). A sub-wavelength level polarizer with high contract and high tolerance of incident ray's angle in the range of visible wavelength. In Nanoengineering: Fabrication, Properties, Optics, and Devices IV (Vol. 6645). [664529] https://doi.org/10.1117/12.735455

A sub-wavelength level polarizer with high contract and high tolerance of incident ray's angle in the range of visible wavelength. / Lo, Yi Chien; Cheng, Kai Yuan; Teng, Tun Chien; Sun, Ching Cherng.

Nanoengineering: Fabrication, Properties, Optics, and Devices IV. Vol. 6645 2007. 664529.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Lo, YC, Cheng, KY, Teng, TC & Sun, CC 2007, A sub-wavelength level polarizer with high contract and high tolerance of incident ray's angle in the range of visible wavelength. in Nanoengineering: Fabrication, Properties, Optics, and Devices IV. vol. 6645, 664529, Nanoengineering: Fabrication, Properties, Optics, and Devices IV, San Diego, CA, United States, 07/8/27. https://doi.org/10.1117/12.735455
Lo YC, Cheng KY, Teng TC, Sun CC. A sub-wavelength level polarizer with high contract and high tolerance of incident ray's angle in the range of visible wavelength. In Nanoengineering: Fabrication, Properties, Optics, and Devices IV. Vol. 6645. 2007. 664529 https://doi.org/10.1117/12.735455
Lo, Yi Chien ; Cheng, Kai Yuan ; Teng, Tun Chien ; Sun, Ching Cherng. / A sub-wavelength level polarizer with high contract and high tolerance of incident ray's angle in the range of visible wavelength. Nanoengineering: Fabrication, Properties, Optics, and Devices IV. Vol. 6645 2007.
@inproceedings{d1fcfb0aeb8a4581825c1dc919971698,
title = "A sub-wavelength level polarizer with high contract and high tolerance of incident ray's angle in the range of visible wavelength",
abstract = "In the paper, we design a sub-wavelength level polarizer to replace the traditional polarizer in various optical applications. The structure of the polarizer is a one-dimension periodic grating. It has three layers with different materials. We do the basic design by using {"}Effective Medium Theorem.{"} And we verify and improve the result by using rigorous couple-wave analysis (RCWA). In the range of visible wavelength, the polarizer has high contrast and high tolerance of incident angle in three-dimension space.",
keywords = "Polarizer, Rigorous couple-wave analysis, Sub-wavelength",
author = "Lo, {Yi Chien} and Cheng, {Kai Yuan} and Teng, {Tun Chien} and Sun, {Ching Cherng}",
year = "2007",
month = "12",
day = "1",
doi = "10.1117/12.735455",
language = "English",
isbn = "9780819467935",
volume = "6645",
booktitle = "Nanoengineering",

}

TY - GEN

T1 - A sub-wavelength level polarizer with high contract and high tolerance of incident ray's angle in the range of visible wavelength

AU - Lo, Yi Chien

AU - Cheng, Kai Yuan

AU - Teng, Tun Chien

AU - Sun, Ching Cherng

PY - 2007/12/1

Y1 - 2007/12/1

N2 - In the paper, we design a sub-wavelength level polarizer to replace the traditional polarizer in various optical applications. The structure of the polarizer is a one-dimension periodic grating. It has three layers with different materials. We do the basic design by using "Effective Medium Theorem." And we verify and improve the result by using rigorous couple-wave analysis (RCWA). In the range of visible wavelength, the polarizer has high contrast and high tolerance of incident angle in three-dimension space.

AB - In the paper, we design a sub-wavelength level polarizer to replace the traditional polarizer in various optical applications. The structure of the polarizer is a one-dimension periodic grating. It has three layers with different materials. We do the basic design by using "Effective Medium Theorem." And we verify and improve the result by using rigorous couple-wave analysis (RCWA). In the range of visible wavelength, the polarizer has high contrast and high tolerance of incident angle in three-dimension space.

KW - Polarizer

KW - Rigorous couple-wave analysis

KW - Sub-wavelength

UR - http://www.scopus.com/inward/record.url?scp=42149084677&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=42149084677&partnerID=8YFLogxK

U2 - 10.1117/12.735455

DO - 10.1117/12.735455

M3 - Conference contribution

AN - SCOPUS:42149084677

SN - 9780819467935

VL - 6645

BT - Nanoengineering

ER -