Abstract
An extremely narrow and thin silicon wire has been fabricated on a silicon-on-insulator wafer (see Figure). The room-temperature Coulomb blockade effects as well as the influence of a capacitively coupled gate on the transport properties of this conducting silicon quantum wire are studied. The results obtained are encouraging for the application of such wires in single-electron transistors.
| Original language | English |
|---|---|
| Pages (from-to) | 736-739 |
| Number of pages | 4 |
| Journal | Advanced Materials |
| Volume | 14 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - 2002 May 17 |
| Externally published | Yes |
ASJC Scopus subject areas
- General Materials Science
- Mechanics of Materials
- Mechanical Engineering