A novel illuminator design in a rapid thermal processor

Min Hung Lee; Chee Wee Liu

doi:10.1109/66.920726

A novel illuminator design in a rapid thermal processor

Min Hung Lee^*, Chee Wee Liu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

The instantaneous insertion of an opaque shutter between the lamp arrays and the wafer in a rapid thermal processor can significantly increase the ramp-down rate from 90 to 400 °C/s during the cooling period. This shutter can prevent the residual heating of lamp filament as well as the self-heating from the reflector due to the mirror image of the wafer. To compensate for the weak irradiation intensity close to the edge of the linear lamps, a multiplane reflector design is used to increase the uniformity of irradiation intensity in the direction along the linear lamps. The distance between the reflector plane and the linear lamp is designed to be smaller at the edge, as compared to the center, of the linear lamp. Together with two oblique reflectors at the ends of the linear lamps, a typical three-plane reflector design can increase the uniformity by 60% in a typical lamp configuration.

Original language	English
Pages (from-to)	152-156
Number of pages	5
Journal	IEEE Transactions on Semiconductor Manufacturing
Volume	14
Issue number	2
DOIs	https://doi.org/10.1109/66.920726
Publication status	Published - 2001 May
Externally published	Yes

Keywords

Rapid thermal process
Reflector
Self-heating
Spike ramp

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Industrial and Manufacturing Engineering
Electrical and Electronic Engineering

Access to Document

10.1109/66.920726

Cite this

@article{6ec17afc32284d338b4dc90c03703c06,

title = "A novel illuminator design in a rapid thermal processor",

abstract = "The instantaneous insertion of an opaque shutter between the lamp arrays and the wafer in a rapid thermal processor can significantly increase the ramp-down rate from 90 to 400 °C/s during the cooling period. This shutter can prevent the residual heating of lamp filament as well as the self-heating from the reflector due to the mirror image of the wafer. To compensate for the weak irradiation intensity close to the edge of the linear lamps, a multiplane reflector design is used to increase the uniformity of irradiation intensity in the direction along the linear lamps. The distance between the reflector plane and the linear lamp is designed to be smaller at the edge, as compared to the center, of the linear lamp. Together with two oblique reflectors at the ends of the linear lamps, a typical three-plane reflector design can increase the uniformity by 60% in a typical lamp configuration.",

keywords = "Rapid thermal process, Reflector, Self-heating, Spike ramp",

author = "Lee, {Min Hung} and Liu, {Chee Wee}",

year = "2001",

month = may,

doi = "10.1109/66.920726",

language = "English",

volume = "14",

pages = "152--156",

journal = "IEEE Transactions on Semiconductor Manufacturing",

issn = "0894-6507",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "2",

}

TY - JOUR

T1 - A novel illuminator design in a rapid thermal processor

AU - Lee, Min Hung

AU - Liu, Chee Wee

PY - 2001/5

Y1 - 2001/5

N2 - The instantaneous insertion of an opaque shutter between the lamp arrays and the wafer in a rapid thermal processor can significantly increase the ramp-down rate from 90 to 400 °C/s during the cooling period. This shutter can prevent the residual heating of lamp filament as well as the self-heating from the reflector due to the mirror image of the wafer. To compensate for the weak irradiation intensity close to the edge of the linear lamps, a multiplane reflector design is used to increase the uniformity of irradiation intensity in the direction along the linear lamps. The distance between the reflector plane and the linear lamp is designed to be smaller at the edge, as compared to the center, of the linear lamp. Together with two oblique reflectors at the ends of the linear lamps, a typical three-plane reflector design can increase the uniformity by 60% in a typical lamp configuration.

AB - The instantaneous insertion of an opaque shutter between the lamp arrays and the wafer in a rapid thermal processor can significantly increase the ramp-down rate from 90 to 400 °C/s during the cooling period. This shutter can prevent the residual heating of lamp filament as well as the self-heating from the reflector due to the mirror image of the wafer. To compensate for the weak irradiation intensity close to the edge of the linear lamps, a multiplane reflector design is used to increase the uniformity of irradiation intensity in the direction along the linear lamps. The distance between the reflector plane and the linear lamp is designed to be smaller at the edge, as compared to the center, of the linear lamp. Together with two oblique reflectors at the ends of the linear lamps, a typical three-plane reflector design can increase the uniformity by 60% in a typical lamp configuration.

KW - Rapid thermal process

KW - Reflector

KW - Self-heating

KW - Spike ramp

UR - http://www.scopus.com/inward/record.url?scp=0035334299&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035334299&partnerID=8YFLogxK

U2 - 10.1109/66.920726

DO - 10.1109/66.920726

M3 - Article

AN - SCOPUS:0035334299

SN - 0894-6507

VL - 14

SP - 152

EP - 156

JO - IEEE Transactions on Semiconductor Manufacturing

JF - IEEE Transactions on Semiconductor Manufacturing

IS - 2

ER -

A novel illuminator design in a rapid thermal processor

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this