Original language | Chinese (Traditional) |
---|---|
Journal | 國家奈米元件實驗室newsletter |
Issue number | 12 |
Publication status | Published - 2008 |
利用在矽基板上Si(上標 +)預離子佈置來提高GeSi緩衝層的鬆驰以利Ge的成長
忠諺 楊
Research output: Contribution to journal › Article › peer-review
忠諺 楊
Research output: Contribution to journal › Article › peer-review
Original language | Chinese (Traditional) |
---|---|
Journal | 國家奈米元件實驗室newsletter |
Issue number | 12 |
Publication status | Published - 2008 |