利用在矽基板上Si(上標 +)預離子佈置來提高GeSi緩衝層的鬆驰以利Ge的成長

忠諺 楊

Research output: Contribution to journalArticle

Original languageChinese (Traditional)
Journal國家奈米元件實驗室newsletter
Issue number12
Publication statusPublished - 2008

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