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Ming-Jenq Twu

 https://orcid.org/0000-0001-8577-4424
  • 46 Citations
  • 5 h-Index
1988 …2016
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MOSFET devices Engineering & Materials Science
metal oxide semiconductors Physics & Astronomy
Nitrides Engineering & Materials Science
field effect transistors Physics & Astronomy
Reactive sputtering Engineering & Materials Science
Magnetron sputtering Engineering & Materials Science
Taguchi methods Engineering & Materials Science
Metal cutting Engineering & Materials Science

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Research Output 1988 2016

  • 46 Citations
  • 5 h-Index
  • 8 Article
  • 4 Conference contribution
  • 1 Paper
  • 1 Conference article
5 Citations (Scopus)

Effects of TiN, CrN and TiAlN coatings using reactive sputtering on the fatigue behaviour of AA2024 and medium carbon steel specimens

Twu, M-J., Hu, C. C., Liu, D. W., Hsu, C. Y. & Kuo, C-G., 2016 May 2, In : Journal of Experimental Nanoscience. 11, 7, p. 581-592 12 p.

Research output: Contribution to journal › Article

Reactive sputtering
Carbon steel
Fatigue of materials
Coatings
Ceramic coatings
17 Citations (Scopus)

Properties of TiO2 films deposited on flexible substrates using direct current magnetron sputtering and using high power impulse magnetron sputtering

Twu, M. J., Chiou, A. H., Hu, C. C., Hsu, C. Y. & Kuo, C. G., 2015 Jul 1, In : Polymer Degradation and Stability. 117, p. 1-7 7 p., 7600.

Research output: Contribution to journal › Article

Magnetron sputtering
impulses
magnetron sputtering
direct current
Substrates
2 Citations (Scopus)

The impacts of contact etch stop layer thickness and gate height on channel stress in strained N-metal oxide semiconductor field effect transistors

Lin, K. C., Twu, M-J., Deng, R. H. & Liu, C-H., 2015 Jan 1, In : Journal of Nanoscience and Nanotechnology. 15, 4, p. 2673-2679 7 p.

Research output: Contribution to journal › Article

Semiconductors
MOSFET devices
metal oxide semiconductors
Oxides
field effect transistors

Impact of stress induced by stressors on hot carrier reliability of strained nMOSFETs

Lin, K. C., Twu, M-J., Juan, P. C., Hsu, H. W., Huang, H. S., Wang, M. C. & Liu, C-H., 2014 Jan 1, In : International Journal of Nanotechnology. 11, 1-4, p. 27-39 13 p.

Research output: Contribution to journal › Article

Hot carriers
Degradation
Interface states
Gate dielectrics
Threshold voltage
6 Citations (Scopus)

Improved performance for dye-sensitized solar cells using a compact TiO2 layer grown by sputtering

Chang, H. C., Twu, M. J., Hsu, C. Y., Hsu, R. Q. & Kuo, C. G., 2014, In : International Journal of Photoenergy. 2014, 380120.

Research output: Contribution to journal › Article

Fluorine
Tin oxides
tin oxides
Sputtering
fluorine